Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities
نویسندگان
چکیده
Michael Gehl,* Ricky Gibson, Joshua Hendrickson, Andrew Homyk, Antti Säynätjoki, Tapani Alasaarela, Lasse Karvonen, Ari Tervonen, Seppo Honkanen, Sander Zandbergen, Benjamin C. Richards, J. D. Olitzky, Axel Scherer, Galina Khitrova, Hyatt M. Gibbs, Ju-Young Kim, and Yong-Hee Lee College of Optical Sciences, University of Arizona, 1630 East University Boulevard, Tucson, Arizona 85721, USA Air Force Research Laboratory, Sensors Directorate, 2241 Avionics Circle, Building 600, Wright Patterson Air Force Base, Ohio 45433, USA Electrical Engineering and Kavli Nanoscience Institute, California Institute of Technology, MC 200-36, 1200 East California Boulevard, Pasadena, California 91125, USA Department of Microand Nanosciences, Aalto University School of Electrical Engineering, P.O. Box 13500, 00076 Aalto, Finland Advanced Concepts Team, Emcore Corporation, 10420 Research Road, Albuquerque, New Mexico 87123, USA Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Korea *Corresponding author: [email protected]
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